Semiconductor fabrication processes require ultrapure chemicals for product washing, and these must be free of trace metals in order to prevent contamination. Analytical instruments with excellent levels of sensitivity are required to effectively detect contaminants, and must operate effectively in high matrix environments. With industry-leading precision and enhanced efficiency through automation solutions, Agilent’s ICP-MS ORS and ICP-MS/MS technology enables the direct measurement of process chemicals with reduced spectral interference.
